The Effect of the Degree of Fluorination on the MOCVD Growth of Cobalt Oxide Thin Films using Co(II) Acetylacetonate Complexes

Abstract The structurally related cobalt β‐diketonate complexes Co(acac) 2 , ⋅ TMEDA, Co(tfac) and Co(hfac) TMEDA (acac=2,4‐pentanedionate, tfac=1,1,1‐trifluoro‐2,4‐pentane‐dionate, hfac=1,1,1,5,5,5‐hexafluoro‐2,4‐pentane‐dionate, TMEDA= N ′, ′‐tetramethylethylenediamine) were thermochemically (thermogravimetric analysis, differential scanning calorimetry) spectroscopically (infrared, UV‐VIS electron resonance spectroscopy) characterised used as precursor for the MOCVD growth of monoxide (CoO) thin films. influence degree fluorination precursors on morphology (scanning microscopy) phase composition (X‐ray diffraction) CoO films is demonstrated. Carbon, nitrogen fluorine impurities a result thermal decomposition 2,4‐pentanedionate tetraamine ligands in identified by X‐ray photoelectron spectroscopy, time‐of‐flight secondary ion mass spectrometry, Rutherford backscattering spectrometry nuclear reaction analysis. In addition, these contaminants electrocatalytically activity oxygen evolution (OER) alkaline media grown shown.